现在创业公司 的
LLM
训练，在
GPU
和算⼒资源有限的条件下，还能实现登⽉吗？
杨植麟：“登⽉”有⼏个不同的⽣产要素，算⼒肯定是⼀个核⼼，但还有其他的。 你需要⼀个同时满⾜
scalability
和
generality
这两点的架构，但今天其实很多架构已经不满⾜这两条 了。transformer
在已知的
token
space
符合这两条，但放⼤到⼀个更通⽤的场景，也不太符合。数据 做。
19
年最流⾏的是架构是
BERT，后来⼤家问为什么没有⼈去
scale
BERT，其实是因为值得被
scale
的 架构需要具备
scalability
和
generality
这两个条件。我不认为
BERT
没有
scalability，但是你能明显 看到它没有
generality
⸺
不管
scale
到多⼤，它都不可能给你写⼀篇⽂章。多模态过去⼏年也是卡在 架构上，缺少

workflows, splitting up prompts and tools across multiple agents allows for improved performance and scalability. When your agents fail to follow complicated instructions 
 or consistently select incorrect tools

guide is a line that helps you accurately position things—or verify that another line is truly horizontal or vertical. Using the Move tool, you can click and drag a guide. Drag a guide out of the image toolbox, click inside the canvas. Controls in the Tool Options dockable let you switch between Horizontal and Vertical modes. Figure 3.35 Dialog “Flip an Image” After selecting the flip tool from the switch between horizontal and vertical. If it is not already displayed in the dock under the toolbox, double click the toolbox button. You can also use the Ctrl key to switch between horizontal and vertical

of the hatch pattern lines. An orientation of 0 degrees will result in the hatch pattern using horizontal and vertical lines. Hatch width controls the width of each line in the hatch pattern. Hatch gap but the measurement axis is either the X or Y axis. In other words, these dimensions show the horizontal or vertical component of the distance between two points. When creating orthogonal dimensions is turned on. In this mode, up to two track segments may be placed at a time (for example, one horizontal and one diagonal segment). Shove: in this mode, the track being routed will walk around obstacles

of the hatch pattern lines. An orientation of 0 degrees will result in the hatch pattern using horizontal and vertical lines. Hatch width controls the width of each line in the hatch pattern. Hatch gap is turned on. In this mode, up to two track segments may be placed at a time (for example, one horizontal and one diagonal segment). Shove: in this mode, the track being routed will walk around obstacles to modify tracks that are not being routed. Note that Shove and Walk Around modes always create horizontal, vertical, and 45-degree D 42 (H/V/45) track segments. If you need to route tracks with angles

of the hatch pattern lines. An orientation of 0 degrees will result in the hatch pattern using horizontal and vertical lines. Hatch width controls the width of each line in the hatch pattern. Hatch gap but the measurement axis is either the X or Y axis. In other words, these dimensions show the horizontal or vertical component of the distance between two points. When creating orthogonal dimensions turned on. In this D 40 mode, up to two track segments may be placed at a time (for example, one horizontal and one diagonal segment). Shove: in this mode, the track being routed will walk around obstacles

smaller, cheaper models trained for custom use cases** now emerging. Will providers try to build horizontal platforms? Will they dive into specialized applications? Only time will tell. In the short term weeks, Google began adding advertisements to select AI Overviews. Will providers try to build horizontal platforms? Will they dive into specialized applications? Will one or two leaders drive dominant Customer Growth 0 250 500 Q1:23 Q1:24 Q1:25213 AI Monetization Possibilities – Enterprise = Horizontal Platform & / Or Specialized Software?214 To understand where enterprise AI monetization is headed

of capacitors as well as some types of resistors, so it makes sense to identify an outline as a horizontal or vertical axial leaded device and to add some extra information on the relevant dimensions: diameter consistency, if there are only 2 pins they must be in a horizontal arrangement (see figure 4) along the X axis and for 3 pins try to keep 2 in a horizontal arrangement on the X axis. Polarized devices such as most existing KiCad component footprints and VRML models. For items such as a horizontal radial leaded capacitor or a horizontal TO-220 package, prefer to place the leads in a row on the X axis and with the

of capacitors as well as some types of resistors, so it makes sense to identify an outline as a horizontal or vertical axial leaded device and to add some extra information on the relevant dimensions: diameter consistency, if there are only 2 pins they must be in a horizontal arrangement (see figure 4) along the X axis and for 3 pins try to keep 2 in a horizontal arrangement on the X axis. Polarized devices such as most existing KiCad component footprints and VRML models. For items such as a horizontal radial leaded capacitor or a horizontal TO-220 package, prefer to place the leads in a row on the X axis and with the

of capacitors as well as some types of resistors, so it makes sense to identify an outline as a horizontal or vertical axial leaded device and to add some extra information on the relevant dimensions: consistency, if there are only 2 pins they must be in a horizontal arrangement (see figure 4) along the X axis and for 3 pins try to keep 2 in a horizontal arrangement on the X axis. Polarized devices such most existing KiCad component footprints and VRML models. For items such as a horizontal radial leaded capacitor or a horizontal TO-220 package, prefer to place the leads in a row on the X axis and with